Title of article :
On control of resist film uniformity in the microlithography process
Author/Authors :
Weng Khuen Ho، نويسنده , , Arthur Tay، نويسنده , , Lay Lay Lee and Charles D. Schaper، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2004
Pages :
12
From page :
881
To page :
892
Keywords :
Temperature Control , semiconductor manufacturing , Photoresist processing , Generalized predictive control
Journal title :
Electric Power Systems Research
Serial Year :
2004
Journal title :
Electric Power Systems Research
Record number :
373265
Link To Document :
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