Title of article
Investigation of the SiO2/Si(111) interface by means of angle-scanned photoelectron diffraction
Author/Authors
S. Dreiner، نويسنده , , M. Schürmann، نويسنده , , C. Westphal and H. Zacharias، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2001
Pages
6
From page
431
To page
436
Keywords
Chemical shift , Silicon oxide , Interface , Photoelectron diffraction
Journal title
JOURNAL OF ELECTRON SPECTROSCOPY & RELATED PHENOMENA
Serial Year
2001
Journal title
JOURNAL OF ELECTRON SPECTROSCOPY & RELATED PHENOMENA
Record number
379523
Link To Document