Title of article
Effects of elastic-electron scattering on measurements of silicon dioxide film thicknesses by X-ray photoelectron spectroscopy
Author/Authors
C. J. Powell and A. Jablonski، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2001
Pages
5
From page
1139
To page
1143
Keywords
Effective attenuation length , Film thickness , Silicon dioxide , Elastic Scattering , XPS
Journal title
JOURNAL OF ELECTRON SPECTROSCOPY & RELATED PHENOMENA
Serial Year
2001
Journal title
JOURNAL OF ELECTRON SPECTROSCOPY & RELATED PHENOMENA
Record number
379633
Link To Document