مرکز منطقه ای اطلاع رساني علوم و فناوري - Near edge X-ray absorption fine structure spectroscopy of chemically modified porous silicon

Title of article :

Near edge X-ray absorption fine structure spectroscopy of chemically modified porous silicon

Author/Authors :

Y. F. Hu ، نويسنده , , R. Boukherroub and T. K. Sham، نويسنده ,

Issue Information :

روزنامه با شماره پیاپی سال 2004

Pages :

From page :

143

To page :

147

Keywords :

X-ray absorption spectroscopy , Organic monolayer , NEXAFS , Porous silicon

Journal title :

JOURNAL OF ELECTRON SPECTROSCOPY & RELATED PHENOMENA

Serial Year :

2004

Journal title :

JOURNAL OF ELECTRON SPECTROSCOPY & RELATED PHENOMENA

Record number :

379964

Link To Document :