Title of article
Investigation of the SiO2/Si(1 0 0) interface structure by means of angle-scanned photoelectron spectroscopy and diffraction
Author/Authors
S. Dreiner، نويسنده , , M. Schürmann and C. Westphal، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2004
Pages
6
From page
79
To page
84
Keywords
Angle-scanned photoelectron spectroscopy , Chemical shift , Silicon oxide , Photoelectron diffraction
Journal title
JOURNAL OF ELECTRON SPECTROSCOPY & RELATED PHENOMENA
Serial Year
2004
Journal title
JOURNAL OF ELECTRON SPECTROSCOPY & RELATED PHENOMENA
Record number
380012
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