مرکز منطقه ای اطلاع رساني علوم و فناوري - Characterization and degradation of ZEP520 resist film by TOF-PSID and NEXAFS

Title of article :

Characterization and degradation of ZEP520 resist film by TOF-PSID and NEXAFS

Author/Authors :

H. Ikeura-Sekiguchi، نويسنده , , T. Sekiguchi and M. Koike، نويسنده ,

Issue Information :

روزنامه با شماره پیاپی سال 2005

Pages :

From page :

453

To page :

455

Keywords :

Resist , X-ray lithography , Inner-shell excitation , Time-of-flight , synchrotron radiation , desorption

Journal title :

JOURNAL OF ELECTRON SPECTROSCOPY & RELATED PHENOMENA

Serial Year :

2005

Journal title :

JOURNAL OF ELECTRON SPECTROSCOPY & RELATED PHENOMENA

Record number :

380332

Link To Document :