• Title of article

    Ferroelectric memory: on the brink of breaking through

  • Author/Authors

    Derbenwick، نويسنده , , G.F.، نويسنده , , Isaacson، نويسنده , , A.F.، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 2001
  • Pages
    11
  • From page
    20
  • To page
    30
  • Abstract
    With a memory-cell size comparable to that of a DRAM memory cell and a manufacturing process similar to that of a stacked high-density DRAM, it can be expected that the ferroelectric technology will leverage off DRAMs and leap frog to higher memory densities. Cost analysis projects cost competitiveness with flash memory and EEPROM. Ferroelectric memory technology has been shown to have reliability levels comparable to or better than other reprogrammable nonvolatile semiconductor memories. High levels of radiation hardness make these memories suitable for near and deep-space applications. Many large semiconductor companies have substantial efforts to develop and introduce ferroelectric memories into the market
  • Journal title
    IEEE Circuits and Devices Magazine
  • Serial Year
    2001
  • Journal title
    IEEE Circuits and Devices Magazine
  • Record number

    397402