Title of article :
Effective electrostatic discharge protection circuit design using novel fully silicided N-MOSFETs in sub-100-nm device era
Author/Authors :
Jam-Wem Lee، نويسنده , , Yiming Li، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2006
Pages :
5
From page :
211
To page :
215
Keywords :
fully silicided , Semiconductor devices , ULSI. , Simulation , circuit design , design , silicide-blocked , electrostatic discharge(ESD) , Fabrication , floating charge effect , Measurement , nanodevice
Journal title :
IEEE Transactions on Nanotechnology
Serial Year :
2006
Journal title :
IEEE Transactions on Nanotechnology
Record number :
398828
Link To Document :
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