Title of article :
Selective Deposition of Hafnium Oxide Nanothin Films on OTS Patterned Si(100) Substrates by Metal–Organic Chemical Vapor Deposition
Author/Authors :
Byung-Chang Kang، نويسنده , , Duk-Young Jung، نويسنده , , Jin-Hyo Boo، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2006
Pages :
6
From page :
701
To page :
706
Keywords :
HFO2 thin film , Microcontact printing , selective growth. , metal–organic chemical vapordeposition (MOCVD)
Journal title :
IEEE Transactions on Nanotechnology
Serial Year :
2006
Journal title :
IEEE Transactions on Nanotechnology
Record number :
398893
Link To Document :
https://search.isc.ac/dl/search/defaultta.aspx?DTC=10&DC=398893
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