Title of article :
Profile Control in Silicon Nanostructures Using Fluorine-Enhanced Oxide Passivation
Author/Authors :
Yi Zhao، نويسنده , , Xin Zhang، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2008
Pages :
8
From page :
40
To page :
47
Keywords :
Nanomanufacturing , reactiveion etching , nanomechanosensing , silicon nanostructures , passivation.
Journal title :
IEEE Transactions on Nanotechnology
Serial Year :
2008
Journal title :
IEEE Transactions on Nanotechnology
Record number :
399014
Link To Document :
https://search.isc.ac/dl/search/defaultta.aspx?DTC=10&DC=399014
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