Fast Melting of Amorphous Silicon Carbide Induced by Nanosecond Laser Pulse

We report the first experimental detailed study of laser induced surface melting on the nanoscale time scale of amorphous silicon carbide layers produced by ion implantation. Time-resolved reflectivity has been used to observe the fast liquid-solid-liquid transition features, and transmission electron microscopy (TEM) was used in order to study the structure resulting after the fast solidification following the laser induced melting. By means of the evaluation of the laser fluences required to induce melting of amorphous layers of different thickness on top of a crystalline substrate, we evaluated the thermal diffusion coefficient and the melting point of the amorphous material which occurred much lower than for crystalline material. Moreover, we give evidence of amorphous-to-crystal transitions occurring in the solid phase on the nanosecond time scale, for laser irradiation at fluences below the melting threshold. A quite different crystalline structure is observed for crystallization from the liquid phase than from the solid phase.