Effect of Respective Additions of Ga, Zr and Combined Additions of Co, Ga, Zr on Magnetic Properties of Remanence-enhanced Nd8.4Fe87.1B4.5 Alloy

An ultrahigh vacuum chemical vapor deposition (UHV/CVD) system is developed and the details of its construction and operation are reported. Using high purity SiH4 and GeH4 reactant gases, the Si0.82 Ge0.18 layer is deposited at 550°C. With the measurements by double crystal X-ray diffraction (DCXRD), transmission electron microscopy (TEM) and Rutherford backscattering spectroscopy (RBS) techniques, it is shown that the crystalline quality of the SiGe layer is good, and the underlying SiGe/Si heterointerface is sharply defined.