Title of article :
Track etching characteristics of glass track detectors
Author/Authors :
G. S. Randhawa، نويسنده , , H. S. Virk، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 1996
Pages :
4
From page :
351
To page :
354
Abstract :
Samples of barium phosphate (BP-1), soda and quartz glasses have been irrdiated by the 238U (11.4 MeV) ion beam available from the heavy ion UNILAC accelerator at GSI, Darmstadt, Germany. After chemical etching of these specimen samples in appropriate etchants at different temperatures, the values of etched track parameters, viz. bulk etch rate, track etch rate, sensitivity, etching efficiency and the critical of etching, have been determined. The activation energies for bulk and track etch rates have also been determined. Finally, a comparison of the track etch parameters for these glass detectors has been made.
Journal title :
Applied Radiation and Isotopes
Serial Year :
1996
Journal title :
Applied Radiation and Isotopes
Record number :
539481
Link To Document :
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