Bulk etching rate of LR115 detectors

The thickness of the layer of LR115 detector removed during etching was measured with a very precise instrument. Dependence of the bulk etch rate on temperature of the etching solution was investigated. It has been found that the etch rate is (3.27±0.08) μm/h at 60°C in 10%NaOH of water solution. It was also found that the track density in the detector irradiated to radon and its progeny increases linearly with the removed layer.