Thick tellurium electrodeposition on nickel-coated copper substrate for 124I production

Tellurium electrodeposition on a nickel-coated copper substrate was investigated for production of iodine-124. The electrodeposition experiments were carried out by the alkali plating baths. The optimum conditions of the electrodeposition of tellurium were as follows: 6 g l−1 tellurium, pH=10, DC current density of ca. 8.55 mA cm−2 and room temperature.