MOLECULAR STRUCTURE OF IONS IN FLUORINE CONTAIN DIELECTRICS AT THE SECONDARY ION MASS-SPECTROMETRY (SIMS)

In the present paper is given the results of investigation of secondary ions formation mechanisms from a surface of polymeric dielectrics. By calculation of secondary ions’ relative yield in dielectric mass spectrum and the results comparison with various mechanisms, an attempt was made to explain the mechanisms of ion formation at the process of bombardment of dielectric surface by accelerated particles.