Nano-Structure and Electrical Properties of Titanium Thin Films as a Function of substrate temperature

The nano-structural and electrical properties of titanium thin film of 237 nm thickness deposited with a rate of 3.0 nms -1 on glass substrates at different substrate temperatures (390, 470, 510 and 580 K) are studied. The nano- structure of these films was obtained using x-ray diffraction (XRD) and atomic force microscopy (AFM), while the thickness were measured by means of Rutherford back scattering (RBS). XRD results show the development of A (112) TiO2 preferred orientation by increasing the substrate temperature. The results also show that the grain size, the roughness and the conductivity of these films increase with substrate temperature.