Estimating mutagenic compounds generated during photolysis of fenitrothion—by HPLC fractionation followed by mutagenicity testing and high-resolution GC–MS analysis

We aimed to: (1) evaluate the change in mutagenicity of a fenitrothion-containing solution during photolysis and (2) elucidate mutagenic compounds that were possible major contributors to mutagenicity. A batch test involving irradiation by natural sunlight was conducted on the solution, and then HPLC fractionation, mutagenicity testing, and gas chromatography–mass spectrometry (GC–MS) analysis were performed on the irradiated solution. During the 15-day photolysis, fenitrothion was almost completely decomposed, and 34 transformed products (TPs) were generated. Photolysis decreased the mutagenicity of the fenitrothion-containing solution for base-pair-substitution-detecting tester strains (YG1026 and YG1029) but increased mutagenicity for frameshift-detecting tester strains (YG1021 and YG1024). One TP was identified as a potential source of the increased mutagenicity; its molecular formula was estimated to be (CH3O)2PS–O–C8H6NO.