مرکز منطقه ای اطلاع رساني علوم و فناوري - Particle charge distribution measurement in exhaust gases of plasma enhanced processing equipment

Title of article :

Particle charge distribution measurement in exhaust gases of plasma enhanced processing equipment

Author/Authors :

B. R. Forsyth، نويسنده , , B. Y. H. Liu، نويسنده ,

Issue Information :

ماهنامه با شماره پیاپی سال 1998

Pages :

From page :

901

To page :

902

Keywords :

Charge distribution , Aerosol particles , PECVD , Semiconductor Process Exhaust

Journal title :

Journal of Aerosol Science

Serial Year :

1998

Journal title :

Journal of Aerosol Science

Record number :

741759

Link To Document :