Title of article :
High-Power Gas-Discharge EUV Source
Author/Authors :
M.، Borisov, V. نويسنده , , Yu.، Vinokhodov, A. نويسنده , , S.، Ivanov, A. نويسنده , , B.، Kiryukhin, Yu. نويسنده , , V.، Mironov, S. نويسنده , , A.، Mishchenko, V. نويسنده , , V.، Prokof’ev, A. نويسنده , , B.، Khristoforov, O. نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2002
Pages :
-876
From page :
877
To page :
0
Abstract :
The results from studies aimed at creating a high-power high-repetition-rate gas-discharge EUV source based on xenon Zpinch are presented. In a liquid-cooled EUV source prototype, an average output power of 10 W for the burst mode (~1 s) and 5 W for continuous operation, emitted into a solid angle of 0.25 sr and 2% bandwidth around 13.5 nm is attained at a repetition rate of ~1 kHz. Operating wavelength of the source corresponds to XeXI 13.5-nm ion emission band. It is experimentally shown that the size of the emitting hot plasma can be decreased to ~2 mm without loss in the average output power. The radiation characteristics were determined by using standard techniques and calibrated metrology tools, which allowed a comparison of the absolute values of the measured parameters with the available data on other EUV sources developed for the next-generation lithography with a resolution of ~50 nm. The attained level of an average EUV power of 10 W at (lambda) = 13.5 nm into the 0.25-sr solid angle and 2% bandwidth is one of the highest at the moment.
Keywords :
Sourcing , Purchasing management , Decision-making under risk , Decision trees
Journal title :
PLASMA PHYSICS REPORT
Serial Year :
2002
Journal title :
PLASMA PHYSICS REPORT
Record number :
81055
Link To Document :
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