Title of article :
Porous silicon upon multicrystalline silicon:
Structure and photoluminiscence
Author/Authors :
M. M. MELNICHENKO، نويسنده , , K. V. SVEZHENTSOVA، نويسنده , , A. N. Shmyryeva، نويسنده ,
Issue Information :
دوهفته نامه با شماره پیاپی سال 2005
Abstract :
Ultrathin porous silicon layers have been stain-etched upon multicrystalline silicon
(multi-Si) substrates. We studied optical and structural properties of porous silicon by
photoluminescence, photo-luminescence excitation, reflection, atomic force microscopy
and scanning tunnel microscopy methods. It was observed that the thickness of porous
silicon did not exceed 20 nm. The photoluminescence method has shown that
photoluminescence spectra of porous silicon of different grains have shown that they differ
insignificantly (∼10%) in intensity. It was found that por-Si layers with optimal antireflection
characteristics was obtained during etching time 7 min. In the paper the comparison of the
reflection characteristics of investigated samples por-Si with industrial antireflection
coating is presented. C 2005 Springer Science + Business Media, Inc.
Journal title :
Journal of Materials Science
Journal title :
Journal of Materials Science