Title of article :
Dynamics of STO heteroepitaxial growth by pulsed laser deposition
Author/Authors :
X. Z. Liu، نويسنده , , S. M. HE، نويسنده , , D. H. LI، نويسنده , , Q. F. LU، نويسنده , , Z. H. WANG، نويسنده , , S. X. BAO، نويسنده , , Y. R. Li، نويسنده ,
Issue Information :
دوهفته نامه با شماره پیاپی سال 2005
Pages :
7
From page :
5139
To page :
5145
Abstract :
The heteroepitaxial growth dynamics of STO thin films on (100) LaAlO3 substrate by pulsed laser deposition has been studied. The laser energy density was found to be an important factor to determine the growth mechanics. High laser energy density is benefit to two dimensional layer-by-layer growth. Island growth prevails at low substrate temperature. STO thin films deposited at low oxygen partial pressure showed pellicular square grains. High oxygen partial pressure resulted in spherical STO grains. Step-terrace on substrate surface acts as a preferential nucleation site for adatoms, which leads to step-flow growth. STO thin films with atomic flat surface has been prepared on step-terraced substrate. C 2005 Springer Science + Business Media, Inc.
Journal title :
Journal of Materials Science
Serial Year :
2005
Journal title :
Journal of Materials Science
Record number :
830266
Link To Document :
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