Title of article :
Effect of zirconium addition on formation of CoSi2 thin films
Author/Authors :
FANXIONG CHENG?، نويسنده , , CHUANHAI JIANG، نويسنده , , XIANPING DONG، نويسنده , , HAIFENG WU، نويسنده , , Jiansheng Wu، نويسنده ,
Issue Information :
دوهفته نامه با شماره پیاپی سال 2005
Pages :
4
From page :
5655
To page :
5658
Abstract :
CoSi2 thin films were prepared by annealing the amorphous Co-Si thin films. Zr was added into the amorphous thin film in order to investigate its effect on formation of CoSi2 thin film. It was found that Zr increased the crystallization nucleation barrier and accelerated the complete transformation of CoSi to CoSi2. C 2005 Springer Science + Business Media, Inc.
Journal title :
Journal of Materials Science
Serial Year :
2005
Journal title :
Journal of Materials Science
Record number :
830348
Link To Document :
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