• Title of article

    Microstructure development and nonlinear electrical characteristics of the SnO2·CuO·Ta2O5 based varistors

  • Author/Authors

    CHUN-MING WANG?، نويسنده , , Jinfeng Wang، نويسنده , , WEN-BIN SU، نويسنده , , HONG-CUN CHEN، نويسنده , , GUO-ZHONG ZANG، نويسنده , , PENG QI، نويسنده ,

  • Issue Information
    دوهفته نامه با شماره پیاپی سال 2005
  • Pages
    4
  • From page
    6459
  • To page
    6462
  • Abstract
    The microstructure development of SnO2·CuO based ceramic material was analyzed by XRD and SEM and the electrical properties were investigated by J-E relation. The secondary phases of copper oxide were found by the XRD. Copper oxide could make tin oxide densify and advance the grain growth, while tantalum oxide would retard the grain growth. Excess copper would centralize at the grain boundaries and prevent the mass transport. The high nonlinear coefficient (α = 27.3) and low leakage current density (JL = 16 μA cm−2) for the 0.05 mol% Ta2O5-doped SnO2·CuO based varistor sample were obtained. The modified defect barrier model for CuO and Ta2O5-doped SnO2 based varistors was introduced. C 2005 Springer Science + Business Media, Inc.
  • Journal title
    Journal of Materials Science
  • Serial Year
    2005
  • Journal title
    Journal of Materials Science
  • Record number

    830465