Title of article
Microstructure development and nonlinear electrical characteristics of the SnO2·CuO·Ta2O5 based varistors
Author/Authors
CHUN-MING WANG?، نويسنده , , Jinfeng Wang، نويسنده , , WEN-BIN SU، نويسنده , , HONG-CUN CHEN، نويسنده , , GUO-ZHONG ZANG، نويسنده , , PENG QI، نويسنده ,
Issue Information
دوهفته نامه با شماره پیاپی سال 2005
Pages
4
From page
6459
To page
6462
Abstract
The microstructure development of SnO2·CuO based ceramic material was analyzed by
XRD and SEM and the electrical properties were investigated by J-E relation. The
secondary phases of copper oxide were found by the XRD. Copper oxide could make tin
oxide densify and advance the grain growth, while tantalum oxide would retard the grain
growth. Excess copper would centralize at the grain boundaries and prevent the mass
transport. The high nonlinear coefficient (α = 27.3) and low leakage current density (JL = 16 μA cm−2) for the 0.05 mol% Ta2O5-doped SnO2·CuO based varistor sample were
obtained. The modified defect barrier model for CuO and Ta2O5-doped SnO2 based
varistors was introduced. C 2005 Springer Science + Business Media, Inc.
Journal title
Journal of Materials Science
Serial Year
2005
Journal title
Journal of Materials Science
Record number
830465
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