Effects of the deposition and patterning processes of the top electrode on the ferroelectric properties of Pt/Pb(Zr,Ti)O3/Pt thin film capacitors

The deformation in the hysteresis loop of Pt/PZT/Pt thin film capacitors due to deposition and patterning processes of the top electrode has been investigated. The PZT film was aged during the deposition of the top electrode and was positively poled during reactive ion etching (RIE) of the top electrode. The PZT film having sputtered top electrode was very sensitive to the RIE process. The film with a thinner top electrode showed less initial switching polarization due to less compressive stress, but better fatigue characteristics due to an enhanced partial switching region.