Title of article :
Mechanical properties of electrodeposited nanocrystalline copper using tensile and shear punch tests
Author/Authors :
Ramesh Kumar Guduru، نويسنده , , Kristopher A. Darling، نويسنده , , Ronald O. Scattergood، نويسنده , , Carl C. Koch، نويسنده , , K. L. Murty، نويسنده ,
Issue Information :
دوهفته نامه با شماره پیاپی سال 2007
Pages :
8
From page :
5581
To page :
5588
Abstract :
Characterization of the mechanical properties of electrodeposited nanocrystalline Cu with an average grain size of 74 nm was carried out using two different testing techniques, shear punch tests and tensile tests. The grain size distribution was broad and the volume fraction of larger grains was appreciable. The electrodeposited Cu had a high yield strength combined with moderate ductility and strain hardening. Scatter in the ductility values was attributed to residual porosity and inhomogeneity in the microstructure. Measurements of the strain rate sensitivity showed a significant increase in the rate sensitivity and a decrease in the activation volume for the deformation of nanocrystalline Cu compared with similar tests on coarsegrained cold worked Cu
Journal title :
Journal of Materials Science
Serial Year :
2007
Journal title :
Journal of Materials Science
Record number :
833078
Link To Document :
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