Title of article
Energy based model to assess interfacial adhesion using a scratch test
Author/Authors
Vincent Le Houe´rou، نويسنده , , Christian Gauthier، نويسنده , , Robert Schirrer، نويسنده ,
Issue Information
دوهفته نامه با شماره پیاپی سال 2008
Pages
8
From page
5747
To page
5754
Abstract
A common way to improve the scratch resistance
of a sensitive surface is to coat it with a thin film.
However, the substrate/thin film adhesion must be well
controlled and measurable. The contribution of the present
work is to propose a global energy balance model of the
blistering process for the scratching of a substrate/thin film
system, which permits one to determine the adhesion of the
system. The adhesion can be measured by following the
delaminated area as a function of the scratching distance
during blistering. The particular case of an experimental
stable blistering process was studied and the corresponding
substrate/thin film adhesion was derived using the global
energy balance model
Journal title
Journal of Materials Science
Serial Year
2008
Journal title
Journal of Materials Science
Record number
834589
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