• Title of article

    Ion transport in inhomogeneous media based on the bipartition model for primary ions

  • Author/Authors

    M. Asadzadeha، نويسنده , , ?، نويسنده , , A. Brahmeb، نويسنده , , J. Kempeb، نويسنده ,

  • Issue Information
    دوهفته نامه با شماره پیاپی سال 2010
  • Pages
    15
  • From page
    2445
  • To page
    2459
  • Abstract
    The present paper is focused on the mathematical modeling of the charged particle transport in nonuniform media. We study the energy deposition of high energy protons and electrons in an energy range of ≈50–500 MeV. This work is an extension of the bipartition model; for high energy electrons studied by Luo and Brahme in [Z. Luo, A. Brahme, High energy electron transport, Phys. Rev. B 46 (1992) 739–752] [42]; and for light ions studied by Luo and Wang in [Z. Luo, S. Wang, Bipartition model of ion transport: an outline of new range theory for light ions, Phys. Rev. B 36 (1987) 1885–1893]; to the field of high energy ions in inhomogeneous media with the retained energy-loss straggling term. In the bipartition model, the transport equation is split into a coupled system of convection–diffusion equations controlled by a partition condition. A similar split is obtained in an asymptotic expansion approach applied to the linear transport equation yielding pencil beam and broad beam models, which are again convection–diffusion type equations. We shall focus on the bipartition model applied for solving three types of problems: (i) normally incident ion transport in a slab; (ii) obliquely incident ion transport in a semi-infinite medium; (iii) energy deposition of ions in a multilayer medium. The broad beam model of the proton absorbed dose was illustrated with the results of a modified Monte Carlo code: SHIELD - HIT+.
  • Keywords
    Charged particle transport equation , Inhomogeneous media , Bipartition model , Ion transport
  • Journal title
    Computers and Mathematics with Applications
  • Serial Year
    2010
  • Journal title
    Computers and Mathematics with Applications
  • Record number

    921715