Title of article
Microcrystalline silicon grown by VHF PECVD and the fabrication of solar cells
Author/Authors
Yongsheng Chen، نويسنده , , b، نويسنده , , *، نويسنده , , Jianhua Wang، نويسنده , , Jingxiao Lu b، نويسنده , , Wen Zheng b، نويسنده , , Jinhua Gub، نويسنده , , Shi-e Yang b، نويسنده , , Xiaoyong Gao b، نويسنده ,
Issue Information
ماهنامه با شماره پیاپی سال 2008
Pages
5
From page
1083
To page
1087
Abstract
Intrinsic microcrystalline silicon has been deposited by very high frequency plasma enhanced chemical vapor deposition technique at
frequency of 75 MHz. Different gas mixtures of silane and hydrogen were utilized, and the evolution of microstructure and phase in film
were studied, while keeping the substrate temperature at 200 C and the chamber pressure at 0.5 Torr. Optimised material was inserted in
p–i–n solar cells: preliminary efficiency of 5.5% was reached for 1 lm-thick solar cells with the Voc around 0.6 V.
2008 Published by Elsevier Ltd
Keywords
microcrystalline silicon , Solar cells , VHF PECVD , AFM
Journal title
Solar Energy
Serial Year
2008
Journal title
Solar Energy
Record number
939985
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