• Title of article

    Optical, structural and electrochromic properties of nickel oxide films produced by sol–gel technique

  • Author/Authors

    K.K. Purushothaman a، نويسنده , , S. Joseph Antony b، نويسنده , , N. G. Muralidharan، نويسنده , , ?، نويسنده ,

  • Issue Information
    ماهنامه با شماره پیاپی سال 2011
  • Pages
    7
  • From page
    978
  • To page
    984
  • Abstract
    Nickel oxide films have been deposited from nickel acetate precursor using a sol–gel dip coating method, onto glass and conducting fluorine doped tin oxide (FTO) glass substrate. The direct energy gap (Egd) values for the 2–10 layered films are in the range of 3.62 eV–3.72 eV. X-ray diffraction (XRD) analysis reveals that films consisting of 2–6 layers are amorphous, while films consisting of 8–10 layers are poly-crystalline with cubic grains of around 12 nm–20 nm and preferential growth along the (1 1 1) and (2 0 0) planes. Fourier Transform Infrared (FTIR) spectrum confirms the formation of Ni–O. Electrochromic properties of the nickel oxide coatings were studied using cyclic voltammetric (CV) technique. The 8 layered NiO films exhibit the anodic/cathodic diffusion coefficient of 16.7/ 5.73 10 13 cm2/s and the change in optical transmission is DT630nm = 53% with a photopic contrast ratio of 2.87. 2011 Elsevier Ltd. All rights reserved.
  • Keywords
    Thin films , Electrochromics , Sol–gel , NiO
  • Journal title
    Solar Energy
  • Serial Year
    2011
  • Journal title
    Solar Energy
  • Record number

    940568