• Title of article

    An overview of the slow-positron beam facility at the photon factory, KEK

  • Author/Authors

    Toshikazu Kurihara، نويسنده , , Akihiro Shirakawa، نويسنده , , Atsushi Enomoto، نويسنده , , Tetsuo Shidara، نويسنده , , Hitoshi Kobayashi، نويسنده , , Kazuo Nakahara، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 1995
  • Pages
    4
  • From page
    178
  • To page
    181
  • Abstract
    The KEK slow-positron source is in the final stage of construction. The beam line comprises a 31 m long vacuum duct within an axial magnetic field and a following electrostatic guided section. In order to vary the energy of a positron beam dedicated to depth-profile measurements, a high voltage station capable of applying 60 kV has been installed in the beam transport system. The target assembly (a water-cooled tantalum rod of 5 radiation lengths and a moderator with multiple tungsten vanes) and the following straight section (8 m; used for positron storage) are under high voltage. The beam duct located downstream is at ground potential. Positron beams passing through this region have a high kinetic energy. A focusing triplet quadrupole lens and a moderator on the retarding electrode are located at the end of the magnetic transport. This beam line has 9 right-angle-curved ducts, comprising a radius of curvature of 40 cm. Positrons with a maximum energy of 60 keV are guided by bending magnets attached to the beam-transport ducts. A transport system to switch from magnetically guided to electrostatically guided has been installed. The design of the brightness-enhancement stage of the positron beam for positron re-emission microscopy is in progress. In a preliminary experiments at 2.0 GeV with a 2 kW primary beam, 4×106e+/s of slow positrons were observed by detecting annihilation γ-rays at the end of the magnetic beam-transport line. Further improvements are expected by careful surface and thermal treatments of the moderator.
  • Journal title
    Applied Surface Science
  • Serial Year
    1995
  • Journal title
    Applied Surface Science
  • Record number

    989941