SiO2 film deposition by XeCl laser ablation of fused silica

Some interesting features of laser ablation of fused silica at 308 nm wavelength are reported. In particular it is shown that the major ablation mechanism does not involve a phase transition of the irradiated target but leads to the emission of fragments instead of vapour. Only a few percent of the amount of ablated material is in the gaseous or plasma phase. We present the features (thickness, morphology, particle density, composition) of the film produced for different laser fluences and as a function of the angle subtended by the substrate and the normal to the target. Also we provide evidence that an electrical field does affect the spatial distribution of the emitted material.