Diffusion of Ag on Cu(110) and Cu(111) studied by spatially resolved UV-photoemission

We have studied diffusion by mass transport from ultrathin silver islands deposited epitaxially on Cu(110) and Cu(111) at room temperature. Lateral intensity profiles were obtained with a photoelectron spectrometer which has a spatial resolution in the micron range. Analysis of these profiles as a function of annealing temperature and annealing time allows numbers for diffusion constants and activation energies to be derived.