Preferential sputtering of argon ion bombarded Ni3Al and TaSi2

The effect of the preferential sputtering of Ni3Al and TaSi2 under Ar+ ion bombardment in the energy range of 0.1–4.0 keV is studied by numerical solution of master equations for linear, binary-collision cascades. Results of the calculations are compared to the analytical theory of the preferential sputtering. By such a way, the field of application of the theory is elucidated. Calculations for both low-fluence and high-fluence cases are performed. Main features of composition-depth profiles generated in Ni3Al and TaSi2 by argon bombardment are briefly discussed.