Title of article
Cubic metastable FeSi1−x epitaxially grown on Si and MgO substrates Original Research Article
Author/Authors
S. Degroote، نويسنده , , A. Vantomme، نويسنده , , J. Dekoster، نويسنده , , G. Langouche، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 1995
Pages
5
From page
72
To page
76
Abstract
We were able to synthesize an epitaxial metastable FeSi1−x (x=0.15) phase with the defective CsCl structure on Si(111) as well as on MgO(100) with an iron buffer layer. We compared CEMS and RBS/channeling measurements for samples with different film thicknesses. From X-ray diffraction measurements, we could derive the lattice parameter of the cubic structure on the different substrates. On Si(100) the FeSi1−x phase with defective CsCl structure was not observed. CEMS measurements revealed a lower than cubic site symmetry for the iron atoms and no epitaxy was observed for the latter samples.
Journal title
Applied Surface Science
Serial Year
1995
Journal title
Applied Surface Science
Record number
990253
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