Title of article :
The effect of ion implantation on the properties of Al films
Author/Authors :
M. Zaborowski، نويسنده , , A. Barcz، نويسنده , , G. Gawlik، نويسنده , , I.W. Rangelow، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 1995
Pages :
7
From page :
239
To page :
245
Abstract :
The influence of irradiation of Al or Al-based films on the surface morphology is studied by a number of methods. F, B, Mg, Cd, As, Sb, Cr and Ar were chosen as implanting species in order to cover a wide variety of chemical reactivities with aluminium. Implantation of boron and, to a lesser extent, of fluorine or chromium was found beneficial in suppressing population of hillocks, predominantly those of medium or larger size.
Journal title :
Applied Surface Science
Serial Year :
1995
Journal title :
Applied Surface Science
Record number :
990280
Link To Document :
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