Author/Authors :
Ti nitride phases in thin films deposited by DC magnetron sputtering Original Research Article
Pages 295-302
Rodica Manaila، نويسنده , , Domokos Biro، نويسنده , , Peter B. Barna، نويسنده , , Miklos Adamik، نويسنده , , Florin Zavaliche، نويسنده , , Stefan Craciun، نويسنده , , as well as stacking disorder on (111) planes، نويسنده , , both correlated with deposition parameters، نويسنده , , including the degree of plasma ionization. Evidence was found for plastic deformation relaxing film stress. The structure data are correlated with film microstructure and microhardness.، نويسنده ,
Abstract :
Ti nitride films were deposited by DC magnetron sputtering on HSS and Si substrates. X-ray diffraction showed the formation of single-phase δ-TiN. (111) texture was found in most films, as well as stacking disorder on (111) planes, both correlated with deposition parameters, including the degree of plasma ionization. Evidence was found for plastic deformation relaxing film stress. The structure data are correlated with film microstructure and microhardness.
