Title of article
Ti nitride phases in thin films deposited by DC magnetron sputtering
Author/Authors
Ti nitride phases in thin films deposited by DC magnetron sputtering Original Research Article Pages 295-302 Rodica Manaila، نويسنده , , Domokos Biro، نويسنده , , Peter B. Barna، نويسنده , , Miklos Adamik، نويسنده , , Florin Zavaliche، نويسنده , , Stefan Craciun، نويسنده , , as well as stacking disorder on (111) planes، نويسنده , , both correlated with deposition parameters، نويسنده , , including the degree of plasma ionization. Evidence was found for plastic deformation relaxing film stress. The structure data are correlated with film microstructure and microhardness.، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 1995
Pages
8
From page
295
To page
302
Abstract
Ti nitride films were deposited by DC magnetron sputtering on HSS and Si substrates. X-ray diffraction showed the formation of single-phase δ-TiN. (111) texture was found in most films, as well as stacking disorder on (111) planes, both correlated with deposition parameters, including the degree of plasma ionization. Evidence was found for plastic deformation relaxing film stress. The structure data are correlated with film microstructure and microhardness.
Journal title
Applied Surface Science
Serial Year
1995
Journal title
Applied Surface Science
Record number
990289
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