مرکز منطقه ای اطلاع رساني علوم و فناوري - Ultra-thin gate dielectrics grown by low-temperature processes for applications to ULSI devices

Title of article :

Ultra-thin gate dielectrics grown by low-temperature processes for applications to ULSI devices

Author/Authors :

Huey-Liang Hwang، نويسنده , , Po-Ching Chen، نويسنده , , Klaus Y.J. Hsu، نويسنده ,

Issue Information :

روزنامه با شماره پیاپی سال 1996

Pages :

From page :

180

To page :

192

Abstract :

Huey-Liang Hwang, Po-Ching Chen, Klaus Y.J. Hsu

Journal title :

Applied Surface Science

Serial Year :

1996

Journal title :

Applied Surface Science

Record number :

990339

Link To Document :