Title of article :
Ellipsometric studies of the oxidation kinetics of Cu particles supported on oxidised Si(100)
Author/Authors :
R. van Wijk، نويسنده , , O.L.J. Gijzeman، نويسنده , , J.W. Geus، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 1996
Abstract :
The oxidation of Cu particles supported on oxidised Si(100) by molecular oxygen was investigated by means of ellipsometry and Auger electron spectroscopy. The oxidation between 373 and 673 K of three different particle sizes was investigated: 4, 5 and 15 nm particles respectively. The δΔ curves of oxidation were divided into a part corresponding to surface oxidation, oxidation of the particles from Cu to Cu2O and oxidation from Cu2O to CuO0.67. All measured δΔ curves scaled in the exposure, indicating a first order dependence on the oxygen pressure. The following activation energies for the oxidation from Cu to Cu2O were obtained: Eact = 28 ± 5 kJ/mol for 4 nm, Eact = 30 ± 5 kJ/mol for 5 nm and Eact = 25 ± 5 kJ/mol for 15 nm particles. For the oxidation of Cu2O to CuO0.67: Eact = 38 ± 4 kJ/mol for 4 nm, Eact = 36 ± 4 kJ/mol for 5 nm and Eact = 37 ± 4 kJ/mol for 15 nm particles.
Journal title :
Applied Surface Science
Journal title :
Applied Surface Science