Title of article :
Local field and potential barrier in tunneling processes
Author/Authors :
M.M. Mollicone، نويسنده , , L.C.O. Dacal، نويسنده , , C.M.C. de Castilho، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 1996
Pages :
5
From page :
68
To page :
72
Abstract :
Ionisation rate-constants in conditions of imaging processes in field ion microscopy are calculated by considering a local electric field that varies along the potential barrier. The results are then compared with previous calculations where the field along the barrier is taken as constant.
Journal title :
Applied Surface Science
Serial Year :
1996
Journal title :
Applied Surface Science
Record number :
990477
Link To Document :
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