Author/Authors :
K.R. Chen، نويسنده , , J.N. Leboeuf، نويسنده , , R.F. Wood، نويسنده , , D.B. Geohegan، نويسنده , , J.M. Donato، نويسنده , , C.L. Liu، نويسنده , , A.A. Puretzky، نويسنده ,
Abstract :
An annealing model is extended to treat the vaporization process, and a hydrodynamic model describes the ablated material. We find that dynamic source and ionization effects accelerate the expansion front of the ablated plume with thermal vaporization temperature. The vaporization process and plume propagation in high background gas pressure are studied.
