Title of article :
Dynamics of silicon plume generated by laser ablation and its chemical reaction
Author/Authors :
T. Makimura، نويسنده , , K. Murakami، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 1996
Abstract :
Chemical reaction of laser-ablated silicon particles with oxygen gas diluted with a helium buffer gas is found by means of soft X-ray absorption spectroscopy. In order to make clear the dynamics of silicon laser plume and the mechanism of the chemical reaction, we measured time-resolved spatial distribution of light emission from the laser-ablated particles as well as time- and space-resolved emission spectra.
Journal title :
Applied Surface Science
Journal title :
Applied Surface Science