Title of article :
The role of gas-phase in the laser etching of Cu by CCl4
Author/Authors :
D. Débarre، نويسنده , , A. Aliouchouche، نويسنده , , J. Boulmer، نويسنده , , B. Bourguignon، نويسنده , , J.P. Budin، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 1996
Pages :
4
From page :
453
To page :
456
Abstract :
In the laser etching of surfaces, the gas-surface chemical reaction used may be spontaneous or induced by a laser-gas interaction. We put into evidence a third mechanism allowing to use gas molecules that interact directly neither with the surface nor with the laser but that contains reactive atoms.
Journal title :
Applied Surface Science
Serial Year :
1996
Journal title :
Applied Surface Science
Record number :
990615
Link To Document :
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