Title of article
XPS and AFM characterization of a vanadium oxide film on TiO2(100) surface
Author/Authors
G. Chiarello، نويسنده , , R. Barberi b، نويسنده , , A. Amoddeo، نويسنده , , L.S. Caputi، نويسنده , , E. Colavita، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 1996
Pages
5
From page
15
To page
19
Abstract
Vanadium oxide has been grown in ultra high vacuum onto a rutile TiO2(100) surface and studied by X-ray photoelectron spectroscopy and atomic force microscopy. The AFM image showed a surface with a peculiar roughness made of three-dimensional structures having an average height of 10 nm and an average base radius of about 100 nm.
Journal title
Applied Surface Science
Serial Year
1996
Journal title
Applied Surface Science
Record number
990698
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