Charge-up and charge compensation on monochromatized X-ray photoelectron spectroscopic measurements of alumina and glass

An attempt was made to characterize the charge-up, and the charge compensation effects by the electron flooding and the sample masking methods on monochromatized XPS measurements of α-alumina and cover glass surfaces. The charge-up potentials varied with X-ray irradiation time in complicated manners. Measurements of the relation between the sample current (ISE) of an electron flooding gun (EFG) and photoelectron spectra enabled the determination of a suitable EFG condition for the α-alumina surface while for the cover glass surface the occurrences of a charge-driven diffusion and partial charge-up behavior due to impurity effects were observed. Most of the charge-up potential was eliminated by the sample masking method without EFG probably due to the low kinetic electrons emitted from the Au mask and supplied to the charged sample surface.