Title of article :
Photo-induced intersubband absorption in Si/Si1−xGex quantum wells
Author/Authors :
P. Boucaud، نويسنده , , L. Wu، نويسنده , , F.H. Julien، نويسنده , , J.-M. Lourtioz، نويسنده , , I. Sagnes، نويسنده , , Y. Campidelli ، نويسنده , , P.-A. Badox، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 1996
Pages :
4
From page :
342
To page :
345
Abstract :
We have investigated photo-induced intersubband absorption in the valence band of Si/SiGe quantum wells. Carriers are optically generated in the quantum wells using interband optical pumping. Both p- and s-polarized intersubband absorptions of 3 nm 30% SiGe multi-quantum wells are measured using a waveguide geometry. At normal incidence, the infrared modulation is surprisingly quenched around 10 μm. We show that this result can be interpreted by taking into account the Fabry-Perot reflections in the multi-quantum well stack and the anomalous dispersion associated with intersubband transitions. The intersubband absorption is found to be dependent on the interband excitation wavelength. This indicates that the s-polarized photo-induced absorptions which involve bound-to-bound and bound-to-continuum transitions are probably assisted by potential fluctuations linked to interface roughness.
Journal title :
Applied Surface Science
Serial Year :
1996
Journal title :
Applied Surface Science
Record number :
990946
Link To Document :
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