Title of article
Local surface state of amorphous NiP and NiB alloy catalysts
Author/Authors
W.S. Xia، نويسنده , , Y. Fan، نويسنده , , Y.S. Jiang، نويسنده , , Y. Chen، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 1996
Pages
9
From page
1
To page
9
Abstract
In this work we employ the self-consistent charged-discrete variational Xα (SCC-DV-Xα) to investigate the local surface state of amorphous NiP and NiB alloy, and obtain the following results. Ni is an electron-deficient center, and the d electronic density of Ni atom in NiB increases with metalloid atom contents, and in NiP it increases for low phosphorus contents but decreases for high phosphorus contents. Phosphorus easily gathers on the surface of catalysts with increasing phosphorus contents. The decrease of the pre-exponential factor of ethylene hydrogenation reaction rate on the amorphous alloys is caused by the metalloid atoms segregated to the surface of the catalysts.
Journal title
Applied Surface Science
Serial Year
1996
Journal title
Applied Surface Science
Record number
990965
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