Title of article :
A high resolution XPS study of a complex insulator: the case of porous silicon
Author/Authors :
F. Leisenberger، نويسنده , , R. Duschek، نويسنده , , R. Czaputa، نويسنده , , S. Surnev and F.P. Netzer، نويسنده , , G. Beamson، نويسنده , , J.A.D. Matthew، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 1997
Pages :
9
From page :
273
To page :
281
Abstract :
High resolution XPS measurements of porous silicon samples with different preparation histories are presented. Variation of photoelectron take off angle and of flood gun conditions leads to the separation of emission of near surface electrically insulated material from substrate silicon emission. Variation of the charging level produces differential shifting in the energies of emission of the porous silicon component, which shows a balance of elemental and oxidised silicon related to preparation conditions. The systems studied display a sharp division between highly homogeneous well earthed elemental silicon and stable charged regions, and provide thus an example of the separation of spectra from a complex insulator-on-support system into individual components.
Journal title :
Applied Surface Science
Serial Year :
1997
Journal title :
Applied Surface Science
Record number :
991293
Link To Document :
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