Title of article
UV laser modifications and etching of polymer films (PMMA) below the ablation threshold
Author/Authors
N Bityurin، نويسنده , , S Muraviov، نويسنده , , A Alexandrov، نويسنده , , A Malyshev، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 1997
Pages
5
From page
270
To page
274
Abstract
The modification of thin polymethylmethacrylate (PMMA) films by the fifth harmonic (λ=216 nm) of a Nd:YAP laser is studied. This modification manifests itself in essential changes of optical properties, film thickness (bulk etching) and solubility in appropriate developers (crosslinking). The modification kinetics is investigated for films of different thickness, for different laser fluences (below ablation threshold), in air, and in vacuum. The nonreciprocal response not connected with laser heating has been obtained.
Journal title
Applied Surface Science
Serial Year
1997
Journal title
Applied Surface Science
Record number
991369
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