• Title of article

    ALE-reactor for large area depositions

  • Author/Authors

    Jarmo I Skarp، نويسنده , , Pekka J Soininen، نويسنده , , Pekka T Soininen، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 1997
  • Pages
    4
  • From page
    251
  • To page
    254
  • Abstract
    An atomic layer epitaxy (ALE) reactor has been constructed for R&D purposes. This piece of equipment can handle up to 30×40 cm2 rectangular plates or 300 mm wafers as substrates. The basic functions of the reactor are described. ZnO and Al2O3 were used as test processes. Thickness variation of less than 2% has been obtained in both cases.
  • Journal title
    Applied Surface Science
  • Serial Year
    1997
  • Journal title
    Applied Surface Science
  • Record number

    991530

    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=10&DC=991530